MECHANICAL PROCESSING OF SILICON SUBSTRATE, SURFACE CLEANING WITH ABRASIVE MATERIALS
| dc.contributor.author | Khabib Shukurullayevich Abdullayev | |
| dc.date.accessioned | 2025-12-29T18:16:30Z | |
| dc.date.issued | 2024-09-30 | |
| dc.description.abstract | This paper explores the processing of silicon substrates in microelectronics, specifically mechanical processing, polishing, oxidation, and other treatments, as well as the theoretical modeling of the thermoelectric properties of porous SiNWs. | |
| dc.format | application/pdf | |
| dc.identifier.uri | https://webofjournals.com/index.php/4/article/view/2193 | |
| dc.identifier.uri | https://asianeducationindex.com/handle/123456789/25290 | |
| dc.language.iso | eng | |
| dc.publisher | Web of Journals Publishing | |
| dc.relation | https://webofjournals.com/index.php/4/article/view/2193/2173 | |
| dc.rights | https://creativecommons.org/licenses/by-nc-nd/4.0 | |
| dc.source | Web of Technology: Multidimensional Research Journal; Vol. 2 No. 9 (2024): WOT; 102-108 | |
| dc.source | 2938-3757 | |
| dc.subject | Semiconductor devices, integrated circuits, local diffusion, thermoelectric properties of porous SiNWs, silicon substrate, silicon oxide, doping, polishing, oxidation, photolithography, p-n junctions. | |
| dc.title | MECHANICAL PROCESSING OF SILICON SUBSTRATE, SURFACE CLEANING WITH ABRASIVE MATERIALS | |
| dc.type | info:eu-repo/semantics/article | |
| dc.type | info:eu-repo/semantics/publishedVersion | |
| dc.type | Peer-reviewed Article |
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