Application of the vacuum method to obtain graphite

dc.contributor.author	Avliyakulov Khayot Nodirovich
dc.contributor.author	Bafoev Bakhrom Botirovich
dc.date.accessioned	2026-01-01T10:46:41Z
dc.date.issued	2022-05-22
dc.description.abstract	The article discusses the conceptual requirements for deposition methods widely used in modern microelectronics. The high deposition rate and the atomic energy incident on the substrate during deposition allow these methods to be used to obtain films with various compositions and structures, especially for low temperature epitaxy.
dc.format	application/pdf
dc.identifier.uri	https://zienjournals.com/index.php/tjet/article/view/1713
dc.identifier.uri	https://asianeducationindex.com/handle/123456789/60563
dc.language.iso	eng
dc.publisher	Zien Journals
dc.relation	https://zienjournals.com/index.php/tjet/article/view/1713/1424
dc.rights	https://creativecommons.org/licenses/by-nc/4.0
dc.source	Texas Journal of Engineering and Technology; Vol. 8 (2022): TJET; 112-114
dc.source	2770-4491
dc.subject	Thermal spraying
dc.subject	resistive spraying
dc.subject	layered system
dc.subject	defect
dc.title	Application of the vacuum method to obtain graphite
dc.type	info:eu-repo/semantics/article
dc.type	info:eu-repo/semantics/publishedVersion
dc.type	Peer-reviewed Article

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