PHYSICAL DEPOSITION OF COATINGS IN VACUUM

dc.contributor.authorUrinov N. F.
dc.contributor.authorSaidova M. Kh.
dc.contributor.authorSobirov M. B.
dc.date.accessioned2025-12-29T11:30:40Z
dc.date.issued2024-12-04
dc.description.abstractThe article presents the process of fphysical deposition of coatings in a vacuum, which consists of spraying a substance in a special vacuum chamber. As well as the main operations of a typical technological process for applying coatings using the PVD method.
dc.formatapplication/pdf
dc.identifier.urihttps://americanjournal.org/index.php/ajtas/article/view/2517
dc.identifier.urihttps://asianeducationindex.com/handle/123456789/17170
dc.language.isoeng
dc.publisherAmerican Journals Publishing
dc.relationhttps://americanjournal.org/index.php/ajtas/article/view/2517/2358
dc.rightshttps://creativecommons.org/licenses/by-nc/4.0
dc.sourceAmerican Journal of Technology and Applied Sciences; Vol. 31 (2024); 16-18
dc.source2832-1766
dc.subjectPhysical deposition, coating, vacuum, ionization, magnetron sputtering, ion beam, electron beam.
dc.titlePHYSICAL DEPOSITION OF COATINGS IN VACUUM
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion
dc.typePeer-reviewed Article

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